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ホーム アーカイブ 役員 今後の会合 American Society of Thermal and Fluids Engineering
Second Thermal and Fluids Engineering  Conference

ISSN: 2379-1748
ISBN: 978-1-56700-430-4

A STUDY OF SILICON DIOXIDE COLLOIDAL SUSPENSION FLOW IN CHANNEL WITH SUDDEN AREA EXPANSION

Emmanuel Hitimana
Iowa State University, Ames, IA 50011, USA

Clement C. Tang
University of North Dakota, Grand Forks, ND 58202, USA

DOI: 10.1615/TFEC2017.ncf.018121
pages 1103-1110

要約

In this study, the experimental investigation was done on the behavior of silicon dioxide (9.58% vol. in water) colloidal suspension flowing in circular channel with sudden area expansion. The parameters studied were the area ratio of the expansion and the static pressures along the axial direction of the flow. These parameters were experimentally analyzed at various mass flow rates ranging from 5 to 30 g/s. The comparative study between the behavior of water flow and silicon dioxide colloid flow showed that the pressure drop due to sudden area expansion increases as a result of the presence of the silicon dioxide nanoparticles. However, the percentage increase in pressure drop is greatly reduced at higher flow rates. For 7.92 g/s, the colloidal suspension flow pressure drop due to sudden area change is approximately 129% higher than the water flow pressure drop. This percentage is reduced to approximately 16.5% at 25.7 g/s.

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